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BEAMER

Electron-Beam Lithography Software

genisysHigh-resolution and high-throughput e-beam lithography is severely impacted by process effects, electron scattering effects, and tool artifacts resulting in non- ideal pattern transfer. Although the e- beam tool is a highly sophisticated and expensive printer, the pattern data needs to be optimized to significantly reduce the effects of various error sources such as beam positioning between shapes, filling shapes with "shots" on a discrete grid, field position dependent aberrations, stitching between fields, the spread of energy by electron scattering (proximity) and process effects.

BEAMER is a comprehensive software platform for preparing data ideally for exposure:

  • Support for allmajor layout and e-beam machine formats
  • Superior machine specific fracturing of complex curved layouts
  • Optimizing field and shot placement, writing strategy and order
  • Library of comprehensive layout processing functions
  • Integrated layout editor
  • Ultra-fast and comprehensive viewer for fast inspection and verification
  • Powerful proximity and process effect correction technology
  • e-beam simulation of absorbed energy and resist contours
enisys

AMO GmbH -Germany

genisys

Weizmann Institute - Israel

genisys

Devin K. Brown, Georgia Institute of Technology - USA

 

BEAMER Major Features

Layout Import / Export:

  • Layouts of unlimited size in all major formats (GDSII, CIF, DXF, LTXT, bitmap)
  • e-beam machine formats (JEOL, Vistec, Elionix, Crestec, Raith, Oasis.Mask, MEBES)

Advanced Fracturing:

  • Support of all major machine formats
  • Optimized for arbitrary shapes
  • Curved fracturing
  • Correction for shot positioning
  • Beam Step Size (BSS) Fracturing
  • Field position control (tiled, floating, manual)
  • Multi Pass exposure
  •  Writing order control

Integrated Layout Editor:

  • Create new layout
  • Edit layout within flow
  • Add text, circle, ellipse, arc,...

Layout VIEWER:

  • Integrated detachable global viewer
  • Multi-view, measurements
  • Metrology support 
  • Shot and field position view

Layout and Boolean Operation:

  • Healing, Biasing, Tone reversal (NOT), Merge
  • AND, OR, XOR, P-XOR, MINUS
  •  Extract layer, datatype, cell, region
  • Scale, Shift, Rotation, Mirror
  • Filter geometries by width, height and area
  • Grid adjustment
  • Mapping layout layers and datatypes
  • Pre-Fracture

PEC and Process Correction

  • Full PEC including short-range corrections
  • Shape PEC for short-and mid-range
  • Corner PEC
  • 3D correction for single and multi layer resist
  • FDA (Feature Dose Assignment)

Flow Control Modules

  • Split
  • Loops with variables
  • Script for starting command line application from flow
  • Optimizer for parameter fitting

Proximity and Process Correction

2D Dose PEC

  • Fast and robust edge equalization technique
  •  Excellent dimension control by optimized dose on feature edges
  • Fracturing based on absorbed energy distribution
  • Perfectly symmetrical and stable for arbitrary shapes

Shape Correction

  • Model based shape correction of short and mid-range effects
  • Combination with long range correction with dose modulation
  • Model based contrast enhancement (“undersize – overdose”)

3D PEC

  • Correction for defined resist thickness at any layout position (resist profile) for single layer resist (e.g. 3D gratings, 3D holograms, angled sidewalls)
  • Correction for critical dimension(CD) for each layer for a multi-layer resist (T-Gate, “bridge”)

Corner PEC

  • Corner sharpening correction at feature edges and corners.
  • Dose PEC combined with rule based correction for edges, inner and outer corners.

Flexible PSF and Process Modeling

  • PSF from Monte Carlo simulation or experimental table
  • Visualization and fit of PSF function
  • Apply full PSF data or Gaussian approximation
  • Process loading, shot size dependent blur, fogging effect

e-beam Modelling

  • 2D intensity image, 2D resist contour at multiple thresholds
  • 1D / 2D image viewing and analysis
  • Multi- and matrix-view for automated runs
  • Metrology for automated measurement and comparison to experiment

Optimizer for Process Calibration

  • Automated fitting of process parameter (e.g. PSF) to experimental data
  • Convenient interface to metrology data
 
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