Webinar:
LAB Simulation of Projection Lithography
Speaker:
Marvin Zai, Qing Tan
Summary:
With the miniaturization progress in manufacturing integrated circuit, projection lithography simulation is a must for process optimization ahead of fabrication. Experimental layout and process optimization is highly time consuming and cost intensive. Lithography simulation allows access to numerous virtual experiment results in a short period of time and thereby significantly reducing development and production cost, and time to market by fast virtual exploration of a large parameter space. This webinar focuses on demonstration of LAB as a simulation tool for projection lithography.
LAB allows full lithography process simulation accurately, including bulk intensity and 3D resist profile. From analysis of intensity or resist development, it has shown its power in layout and process optimization. Process issues have been resolved:
- material stack optimization, e.g., bottom antireflection coating design
- process feasibility analysis via process window
- design OPC to enhance exposure resolution and pattern fidelity
- exposure quality analysis in aerial image
Moreover, LAB is available for other lithography techniques modeling: proximity and laser lithography.