New InSPEC Launched
GenISys proudly presents InSPEC -- Version 2.0 released now
Our new solution InSPEC provides integrated SEM metrology and inspection capabilities to existing SEM tools. InSPEC is an upgrade kit that converts your SEM into a sophisticated metrology tool for supporting nanofabrication of novel patterns and devices.
GenISys addresses the growing need and specific requirements of the R&D nanofabrication and special manufacturing communities by developing versatile and powerful metrology tools. InSPEC complements our established ProSEM package for SEM image offline analysis and automated remote image acquisition. Both products add to our collection of lithography software packages empowering customers to take the next steps in nanotechnology.
After a dedicated development project and much concerted effort with pilot partners and community members, we're happy to announce the launch of InSPEC. End of May at the EIPBN conference in San Diego we introduced it during our BEAMeeting and with a special lunch seminar. Now the improved version 2.0 is released and available. Next, during the MNE conference in September we will have the second part of the InSPEC introduction in particular for our European users.
For more details, please have a look at the InSPEC webpage:
Meet us at MNE 2024 in Montpellier, France for the European launch of InSPEC. We welcome you to attend the BEAMeeting, visit our booth, and register for the InSPEC Luncheon on September 18:
